发明名称 Defect inspection apparatus and defect inspection method
摘要 Light sources emit irradiation lights respectively, so that edge parts of mutual irradiation areas (inspection areas) are superposed one another. The imaging apparatus receives regular reflection lights and generates two images corresponding to each of the light sources. A main control part combines two images and determines presence/absence of a defect. By irradiating an inspected surface A with the irradiation lights from mutually different directions, a position of an area showing the defect in each image is slightly deviated. Therefore, even if a dimension of an area showing the defect is small in each image, by superposing two images one another, the dimension of the area showing a defect part becomes large in the image after composition. Thus, an accuracy of defect detection on the edge part of the inspection area can be improved.
申请公布号 US2007211242(A1) 申请公布日期 2007.09.13
申请号 US20070714853 申请日期 2007.03.07
申请人 OMRON CORPORATION 发明人 OKABE HIROSHI;KANETANI YOSHIHIRO;MATSUMOTO TOSHIHIKO
分类号 G01N21/88 主分类号 G01N21/88
代理机构 代理人
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