| 摘要 |
A memory includes a semiconductor layer provided on an insulation film provided on a first conductivity type substrate; a first well of a second conductivity type provided in the substrate; second wells of the first conductivity type provided in the first well; a third well of a second conductivity type provided in the substrate; a memory cell including a first source, a first drain and a body region, the first source and drain being formed in the semiconductor layer located above one of the second wells; a first logic circuit including a second source, a second drain and a channel region, the second source and drain being formed on the semiconductor layer above another one of the second wells; and a second logic circuit including a third source, a third drain and a channel region, the third source and drain being formed on the semiconductor layer above the third well.
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