| 摘要 |
An exposure apparatus for exposing a pattern of a reticle onto a substrate includes an illumination optical system configured to illuminate the reticle on a target plane to be illuminated using light from a light source, wherein the illumination optical system includes a computer-generated hologram configured to discretely form plural bright spots on a plane that has a Fourier transformation relationship with the target plane when the light that has no angular distribution is incident upon the computer-generated hologram, and an optical element configured to introduce the light that has an angular distribution to the computer-generated hologram.
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