| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate holding technology in an exposure apparatus, which suppresses intruding of a liquid immersion liquid to the backside of a substrate. <P>SOLUTION: The exposure apparatus for exposing the top of a wafer 12 through a liquid layer on the wafer 12 being the substrate. The apparatus includes; a supply means for supplying the liquid onto the wafer 12 held by a vacuum chuck 5D that is a holding means for attracting and holding the wafer 12; and a sealing liquid storing groove 5K arranged along the periphery of a chucking surface of the wafer 12 held by the vacuum chuck 5D, which is a groove for storing any of a fluorine inactive cooling medium, a fluorine-based oil, or a gel polymer material. <P>COPYRIGHT: (C)2007,JPO&INPIT |
