METHOD FOR MANUFACTURING PHOTOSENSITIVE RESIST FILM AND LIQUID CRYSTAL DEVICE MANUFACTURED BY USING THE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a photosensitive resist film with a forward-tapered rim by using a photosensitive resin composition with a reverse-tapered rim, and to provide a liquid crystal device having a topcoat layer comprising the photosensitive resist film with a forward tapered rim manufactured by using the above method.

SOLUTION: The method for manufacturing a photosensitive resist film (topcoat layer) 23A with the forward-tapered rim portions 25A1, 25B1includes steps of: forming a photosensitive resist composition layer of a predetermined thickness on a substrate; exposing the photosensitive resist composition layer through a mask 1A having a predetermined pattern 2 and long patterns 3A1, 3A2along the edges of the predetermined pattern; and developing the resist to form the photosensitive resist film 23A in the predetermined pattern having a forward tapered rim.

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