发明名称 GAS TREATING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a detoxifying apparatus capable of preventing corrosion of a water-cooled chamber caused by hydrogen fluoride. <P>SOLUTION: Treated gas G containing PFC gas is combustion-cracked in a combustion cracking section 2. The inner surface of the water-cooled chamber 3 made of metal to jet water W to the combustion-cracked treated gas G from a water shower 36 for cooling is lined by an ETFE 43. Even if hydrogen fluoride is produced by the reaction of fluorine produced by combustion-cracking the PFC gas, and the water W jetted from the water shower 36, the corrosion of the inner surface of the water-cooled chamber 3 caused by hydrogen fluoride can be prevented. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP2007232308(A) 申请公布日期 2007.09.13
申请号 JP20060056306 申请日期 2006.03.02
申请人 TOSHIBA MATSUSHITA DISPLAY TECHNOLOGY CO LTD 发明人 TOMITA KAZUHIKO;OGAMI KOJI
分类号 F23G7/06;B01D53/70 主分类号 F23G7/06
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