发明名称 POLYIMIDE PRECURSOR COMPOSITION, METHOD FOR FORMING POLYIMIDE FILM, ELECTRONIC PART AND LIQUID CRYSTAL ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide a polyimide precursor composition which can be subjected to a thermal setting treatment at low temperature to form a polyimide film, and to realize an electronic part or a liquid crystal element which has a polyimide film excellent in dielectric constant characteristics, moisture resistance and environment-resistant stability, enables high speed operation and power saving, and has high reliability. SOLUTION: This polyimide precursor composition is characterized by comprising only an organic polar solvent used for synthesizing a polyamic acid, the polyamic acid having repeating units represented by the general formula (PA), and a curing accelerator which accelerates the curing of the polyamic acid and is compounded in an amount of 0.5 to 2.5 mole equivalent per mole equivalent of the repeating unit of the polyamic acid. The curing accelerator is at least one selected from the group consisting of compounds (AC3) obtained by substituting a specific aromatic ring compound with at least two hydroxyl groups. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007231300(A) 申请公布日期 2007.09.13
申请号 JP20070165568 申请日期 2007.06.22
申请人 TOSHIBA CORP 发明人 KAWAMONZEN YOSHIHIRO;OBA MASAYUKI;MIKOSHIBA SATOSHI;MATAKE SHIGERU
分类号 C08G73/10 主分类号 C08G73/10
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