发明名称 Sample holding electrode and a plasma processing apparatus using the same
摘要 A temperature control type sample-holding electrode using a heater capable of enhancing the performance of controlling the electrode temperature and ensuring the uniformity of static adsorption force over the entire surface, the sample-holding electrode being provided in a processing chamber with a sample being disposed thereon, including a dielectric film having a sample-placing surface and a thin electrode film disposed so as to oppose to the sample-placing surface by way of the dielectric film and comprising a layer of a substantially identical height serving both as a static adsorption electrode and a heater electrode, and provided with power source device capable of simultaneously supplying an AC power for heater and DC power for static adsorption to the thin electrode film.
申请公布号 US2007209933(A1) 申请公布日期 2007.09.13
申请号 US20060513070 申请日期 2006.08.31
申请人 发明人 YOSHIOKA KEN;OMOTO YUTAKA;TSUBONE TSUNEHIKO
分类号 C23C14/00 主分类号 C23C14/00
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