发明名称 |
APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD |
摘要 |
Apparatus and methods for conditioning a polishing pad include a base, an arm pivotally coupled to the base and adapted to support a conditioning disk, and an actuator coupled to the base and the arm. The actuator is adapted to cause the arm to press the conditioning disk against the polishing pad with a linearly variable amount of force. A first force is produced with the actuator. The first force is scaled by a linearly variable amount to a second force that is applied to the polishing pad by a conditioning disk. Numerous other aspects are disclosed.
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申请公布号 |
US2007212983(A1) |
申请公布日期 |
2007.09.13 |
申请号 |
US20070684969 |
申请日期 |
2007.03.12 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
NANGOY ROY C.;CHANG SHOU-SUNG;OLGADO DONALD J.K.;CHEN HUNG CHIH;ALONZO GERALD JOHN |
分类号 |
B24B51/00;B24B1/00;B24B21/18 |
主分类号 |
B24B51/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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