| 摘要 |
A maskless exposure apparatus is provided to exhibit convenience in maintenance together with lower production cost, and to prolong the cycle for cleaning, thereby extending the operation time of the apparatus and raising the productivity. A maskless exposure apparatus irradiates light on a substrate(22) coated with a patterning material to form a pattern, wherein the maskless exposure apparatus includes a light source(30) for providing collimated light, a pattern light forming unit(34) for delivering the light(32) emitted from the light source(30) to the substrate(22) selectively according to a data for a pattern shape, and a condensing lens unit(36) for condensing the light(32) emitted from the pattern light forming unit(34) onto the substrate(22). The maskless exposure apparatus further includes a projecting lens unit which is located between the condensing lens unit(36) and the substrate(22) and projects the light emitted from the condensing lens unit(36) onto the substrate(22).
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