发明名称 Plasma Enhanced Chemical Vapor Deposition of Metal Oxide
摘要 A metal oxide coating can be applied to a substrate at a relatively low temperature and at or near atmospheric pressure by carrying a metal oxide precursor and an oxidizing agent through a corona discharge or a dielectric barrier discharge to form the metal oxide and deposit it onto to the substrate.
申请公布号 US2007212486(A1) 申请公布日期 2007.09.13
申请号 US20050547461 申请日期 2005.05.20
申请人 DINEGA DMITRY P;WEIKART CHRISTOPHER M 发明人 DINEGA DMITRY P.;WEIKART CHRISTOPHER M.
分类号 C23C16/40 主分类号 C23C16/40
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