发明名称 |
Plasma Enhanced Chemical Vapor Deposition of Metal Oxide |
摘要 |
A metal oxide coating can be applied to a substrate at a relatively low temperature and at or near atmospheric pressure by carrying a metal oxide precursor and an oxidizing agent through a corona discharge or a dielectric barrier discharge to form the metal oxide and deposit it onto to the substrate.
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申请公布号 |
US2007212486(A1) |
申请公布日期 |
2007.09.13 |
申请号 |
US20050547461 |
申请日期 |
2005.05.20 |
申请人 |
DINEGA DMITRY P;WEIKART CHRISTOPHER M |
发明人 |
DINEGA DMITRY P.;WEIKART CHRISTOPHER M. |
分类号 |
C23C16/40 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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