发明名称 Method of performing multiple stage model calibration for optical imaging simulation models
摘要 A method of calibrating a simulation model of a photolithography process. The method includes the steps of defining a set of input data; defining a simulation model having model parameters which affect the simulation result produced by the simulation model; performing a first stage calibration process in which the model parameters and alignment parameters are adjusted such that the simulation result is within a first predefined error tolerance; and performing a second stage calibration process in which the alignment parameters are fixed and the model parameters are adjusted such that the simulation result is within a second predefined error tolerance.
申请公布号 US2007213967(A1) 申请公布日期 2007.09.13
申请号 US20070708137 申请日期 2007.02.20
申请人 PARK SANGBONG;HSU DUAN-FU S;TEJNIL EDITA 发明人 PARK SANGBONG;HSU DUAN-FU S.;TEJNIL EDITA
分类号 G06G7/48 主分类号 G06G7/48
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