| 摘要 |
<P>PROBLEM TO BE SOLVED: To stably produce an ITO sputtering target having excellent characteristics free from the generation of nodules. <P>SOLUTION: By using ITO powder in which the ratio between the diameter equivalent to a specific surface area obtained by a BET method and the diameter of crystallite obtained by X-ray diffraction, (the diameter equivalent to a specific surface area/the diameter of crystallite) is <1.0, an ITO sintered compact having extremely high density can be stably produced, thus an ITO sputtering target having excellent characteristics free from the generation of nodules can be produced. The ITO powder can be obtained by pulverizing an ITO sintered compact, and the reuse of an ITO sintered compact recovered from a used target or the like is made possible. <P>COPYRIGHT: (C)2007,JPO&INPIT |
