| 摘要 |
A low-pressure process apparatus for processing a substrate includes a chamber, a carrier and an exhaust module. The carrier is disposed in the chamber supporting the substrate. The exhaust module includes a first exhaust unit and a second exhaust unit. The first exhaust unit includes a plurality of first exhaust openings. The second exhaust unit includes a plurality of second exhaust openings. The second exhaust openings surround the first exhaust openings. The first and second exhaust openings are located in the chamber, and air in the chamber is exhausted through the first and second exhaust openings at substantially the same exhaust pressure, thereby decreasing air pressure therein.
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