| 摘要 |
<p>The present invention provides a method for forming metal oxide coatings on a substrate. The method includes the steps of: (a) subjecting a chamber containing a plasma source to vacuum; (b) feeding metal oxide precursor and O<SUB>2</SUB> into a chamber containing a plasma source, wherein the O<SUB>2</SUB> is fed into the chamber at a rate greater than that of the metal oxide precursor; (c) subjecting the substrate to the chamber, wherein the substrate is at a temperature less than 250°C, thereby forming a metal oxide coating on the substrate.</p> |
