| 摘要 |
A method and an apparatus for monitoring defects are provided to improve the precision through the whole process of an area to be detected. An apparatus for monitoring defects includes a defect monitoring apparatus(110), a photographing device(112), a main controller(113), and a light source which is not shown. A light is irradiated toward an inspection surface of a work. The irradiated light is regular reflection, thereby generating a reflection light. The arrangement of a light, the photographing device(112), and the work are arranged such that the photographing device(112) receives light subject to regular reflection. The regular reflection light is condensed on a lens. A photographing device installed in the photographing device(112) receives the condensed reflection light to generate image data.
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