| 摘要 |
A plasma treating apparatus is provided to enhance a substrate inspection efficiency by performing a defect inspecting process on a substrate using a detection unit consisting of a light emitting portion and a light receiving portion and to make the light receiving portion receive stably light in spite of the deviation of a reflection angle due to the sagging of the substrate by diffusing the light using a concave lens. A plasma treating apparatus includes a chamber(2), a mounting unit(4) for mounting a substrate in the chamber, a plurality of substrate lifting members for moving the substrate up and down through the mounting unit, one or more light emitting portions, and a light receiving portion. The light emitting portions(10) are installed at one sidewall of the chamber. The light receiving portion(20) is capable of receiving exactly the light reflected from the substrate through an additional part. The plasma treating apparatus further includes a concave lens for diffusing the light at the light emitting portion.
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