PHOTOMASK, METHOD FOR MANUFACTURING SUCH PHOTOMASK AND PATTERN FORMING METHOD USING SUCH PHOTOMASK

摘要

On a permeable substrate (100), for instance, a mask pattern, which is composed of a light shielding section (101), and a first translucent section (104A) surrounded by a semi-light shielding section (102) are provided. The mask pattern is provided with a first pattern region and a second pattern region facing each other by having the semi-light shielding section (102) and the first translucent section (104A) in between.