DEVELOPING APPARATUS AND METHOD OF DEVELOPING A PHOTOSENSITIVE LAYER USING THE DEVELOPING APPARATUS

摘要

A developing apparatus and a method for developing a photoresist layer using the same are provided to develop an exposed photoresist film accurately by using an ultrasonic applying unit made of ultrasonic generating modules for generating different wavelength. A developing bath(10) provides a receiving space for receiving a wafer on which a photoresist layer(4) having an exposed pattern and a non-exposed pattern(2) is formed. A developing solution(30) is contained in the developing bath to dissolve the exposed pattern or the non-exposed pattern. An ultrasonic applying unit(20) includes an ultrasonic generation module for generation an ultrasonic wave and an ultrasonic output unit for applying the ultrasonic wave in order to improve solubility of the exposed pattern or the non-exposed pattern. The ultrasonic generation module includes a first ultrasonic generation module for generating a first ultrasonic wave having a first wavelength and a second ultrasonic generation module for generating a second ultrasonic wave having a second wavelength.