| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of preventing contamination in an exposure system that is caused by contamination at the end of a substrate. SOLUTION: The substrate processing apparatus 500 comprises: an indexer block 9; a processing block 10 for an antireflection film; a processing block 11 for a resist film; a development processing block 12; a processing block 13 for a resist cover film; a resist cover film removing block 14; a cleaning/drying processing block 15; and an interface block 16. An exposure system 17 is disposed to be adjacent to the interface block 16 of the substrate processing apparatus 500. In the exposure system 17, the exposure processing of the substrate W is performed by an immersion method. In an end cleaning unit of a cleaning/drying processing unit 80 of the cleaning/drying processing block 15, the end of the substrate W is cleaned before it is exposure-processed. COPYRIGHT: (C)2007,JPO&INPIT |
