发明名称 Positivresist - Zusammensetzung und Verfahren zur Erzeugung eines Resist - Musters
摘要 <p>A positive resist composition having excellent size controllability, and a resist pattern forming method are provided. This positive resist composition contains a resin component (A) comprising an alkali soluble constituent unit (a1) which comprises a constituent unit (a11) derived from (α-methyl)hydroxystyrene, and a constituent unit (a2) which has an acid dissociable dissolution inhibiting group including an acid dissociable dissolution inhibiting group (II) represented by the following general formula (II) and/or a specific chain acid dissociable dissolution inhibiting group (III); an acid generator component (B) which generates an acid upon exposure; and preferably contains an aromatic amine (C).</p>
申请公布号 DE112005002819(T5) 申请公布日期 2007.09.13
申请号 DE20051102819T 申请日期 2005.11.28
申请人 TOKYO OHKA KOGYO CO. LTD. 发明人 ANDO, TOMOYUKI;HIROSAKI, TAKAKO
分类号 G03F7/039;G03F7/004;H01L21/027 主分类号 G03F7/039
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