| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming device capable of suppressing the thermal deformation of a mask caused by a thermal load when forming a pattern by the mask film deposition. SOLUTION: The pattern forming device comprises a mask 1 arranged on a first face side of a substrate 2 for forming a pattern, and a plurality of Peltier elements 5 and cooling plates 6 for controlling the temperature of the mask 1 from a second face side of the substrate 2, and controls the cooling power of each Peltier element 5 for every multiple areas of the mask 1. For example, a mask center portion facing a film deposition means 3 becomes higher in temperature than a mask peripheral portion, and the entire mask surface is uniformly cooled by enhancing the cooling power of the Peltier elements 5 arranged on the mask center portion to prevent any positional deviation or defective shape of the pattern caused by the thermal deformation of the mask 1 during the film deposition. COPYRIGHT: (C)2007,JPO&INPIT
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