发明名称 METHOD FOR PRODUCING FINE STRUCTURE, AND FINE STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a structure having regularly arrayed recesses without using a compound of highly toxic hexavalent chromic acid compound. SOLUTION: The method for producing the fine structure having micropores on its surface comprises the steps of: preparing an aluminum member comprising an aluminum substrate and an anodic oxide film containing micropores formed on the surface of the aluminum substrate; removing the film by using an alumina-dissolving solution which contains at least one compound selected from the group consisting of nitric acid, chromium hydroxide, phosphoric acid, a zirconium compound, a titanium compound, a lithium salt, a cerium salt, a magnesium salt, sodium silicofluoride, zinc fluoride, a manganese compound, a molybdenum compound, a magnesium compound and a simple halogen, contains no chromic compound, and dissolves alumina but dissolves no aluminum; and subsequently anodizing the aluminum. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007231339(A) 申请公布日期 2007.09.13
申请号 JP20060052825 申请日期 2006.02.28
申请人 FUJIFILM CORP 发明人 HATANAKA YUSUKE;TOMITA TADAFUMI;HOTTA YOSHINORI;UESUGI AKIO
分类号 C25D11/16;B01J35/10;B82B1/00;B82B3/00;C23G1/12;C25D11/04 主分类号 C25D11/16
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