发明名称 SUBSTRATE STRUCTURE AND METHOD FOR MANUFACTURING PATTERNED LAYER THEREON
摘要 A substrate structure includes a substrate and a plurality of banks formed on the substrate. A substrate structure includes a substrate and a plurality of banks formed on the substrate. The banks and the substrate cooperatively define a plurality of accommodating rooms. The accommodating rooms are configured for accommodating ink. A width W of the bank is a function of a height H of the bank. A plot of the function W=f (H) has at least one discontinuity point. A left hand limit at the at least one discontinuity point being greater than a right hand limit at the at least one discontinuity point.
申请公布号 US2007212526(A1) 申请公布日期 2007.09.13
申请号 US20060557856 申请日期 2006.11.08
申请人 ICF TECHNOLOGY CO., LTD. 发明人 CHOU CHING-YU;LEE DAI-YUAN
分类号 B41M5/00 主分类号 B41M5/00
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