发明名称 LIQUID IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To measure correctly the amount of liquid recovered from the space between the last face of a projection optical system and a substrate. <P>SOLUTION: The liquid immersion optical exposure apparatus exposes the substrate 170 while a liquid is filled in the liquid immersion space between the optical projection system 140 and the substrate 170. The liquid immersion optical exposure apparatus is equipped with a supply 182 to supply the liquid to the liquid immersion space, a recovering portion 190 to recover the liquid from the liquid immersion space, and a control unit 194 including a detector 194a to detect the amount of liquid recovered from the space. The recovering portion 190 includes a container 192 to separate the liquid and gas recovered from the liquid immersion space and a liquid volume sensor 193 to measure the liquid volume in the container 192. The detector 194a detects the amount of liquid recovered from the liquid immersion space based on the output from the liquid volume sensor 193. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007234821(A) 申请公布日期 2007.09.13
申请号 JP20060053800 申请日期 2006.02.28
申请人 CANON INC 发明人 SAKAMOTO EIJI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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