| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a vapor deposition material evaporating device provided with a vapor deposition container having the depth of a predetermined value or more, which is capable of suppressing bumping occurring when heating a vapor deposition material. <P>SOLUTION: A heating means 15 for heating a vapor deposition material is provided in the depth direction of a vapor deposition container 11 so that the vapor deposition material 5 has the temperature gradient in which the temperature is lower toward a bottom surface of a container. A plurality of heaters arranged at the different positions in the depth direction are provided on an outer circumference of the vapor deposition container, and the set temperature of the heaters arranged on the upper side of the vapor deposition material is higher than the set temperature of the heaters arranged on the bottom surface side of the container. <P>COPYRIGHT: (C)2007,JPO&INPIT |
