| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a slurry for polishing showing a high polishing speed for extremely suppressing the generation of scratch, dishing, erosion or fang. <P>SOLUTION: This slurry for metallic polishing contains vinyl monomer 1 to 99 pts.wt. having a functional group where negative ion can be formed; a copolymerization resin obtained by polymerizing the other vinyl system monomer 1 to 99 pts.wt.; and a water-soluble compound from which complex with metal can be formed and oxidant. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
