发明名称 CONFIGURATION MEASURING APPARATUS AND CONFIGURATION MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a configuration measuring apparatus which can be set on a set stage without damaging any thin plate nor allowing any warpage to occur, and can be instantly fixed to and unfixed from the set stage. SOLUTION: The configuration measuring apparatus 1, which measures a configuration of a thin film formed on an electrostatically chargeable thin plate W or a configuration of a surface of the electrostatically chargeable thin plate by using a noncontact way, comprises: the set stage 4 for setting the thin plate W; and a measuring device 6 which is out of contact with the thin plate W being set on the set stage 4 and measures the configuration of the thin film or the configuration of the surface of the thin plate. Furthermore, an electrostatic sucking mechanism 5 for sucking the thin plate W electrostatically is incorporated in the set stage 4. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007232486(A) 申请公布日期 2007.09.13
申请号 JP20060052734 申请日期 2006.02.28
申请人 SEIKO EPSON CORP 发明人 NISHIJIMA TATSUMI
分类号 G01B21/00;G01B11/06;G01B11/30;G01N21/01;G01N21/27;G12B5/00 主分类号 G01B21/00
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