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发明名称
RINSE LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING RESIST PATTERN USING SAME
摘要
申请公布号
EP1580606(A4)
申请公布日期
2007.09.12
申请号
EP20030775910
申请日期
2003.11.27
申请人
AZ ELECTRONIC MATERIALS USA CORP.
发明人
KOBAYASHI, MASAKAZU;ICHIKAWA, HIROYUKI;YAMADA, YOSHIAKI;TANAKA, KEIICHI
分类号
G03F7/32;C11D1/72;C11D11/00;H01L21/027;(IPC1-7):G03F7/32;H01L21/304
主分类号
G03F7/32
代理机构
代理人
主权项
地址
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