发明名称 SILICON SUBSTRATE FOR INK JET HEAD, MANUFACTURING METHOD FOR THE SAME SUBSTRATE, INK JET HEAD, AND MANUFACTURING METHOD FOR THE SAME INK JET HEAD
摘要 A silicon substrate for an ink jet head, a manufacturing method for the substrate, an ink jet head, and a manufacturing method for the ink jet head are provided to stably manufacture an ink jet recording head chip with higher precision. A method for manufacturing a silicon substrate for an ink jet head includes forming an etching mask layer on one side surface of a silicon substrate(1), the etching mask layer having an opening hole at a position corresponding to an ink supply port, forming at least two non-through holes at the longitudinal direction of the opening hole of the etching mask layer through the opening hole, and etching the silicon substrate at the opening to form the ink supply port in the silicon substrate.
申请公布号 KR20070092145(A) 申请公布日期 2007.09.12
申请号 KR20070022312 申请日期 2007.03.07
申请人 CANON KABUSHIKI KAISHA 发明人 SAKAI TOSHIYASU;KOYAMA SHUJI;ONO KENJI;YAMAMURO JUN
分类号 B41J2/015;B41J2/16 主分类号 B41J2/015
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