| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an excellent liquid film forming apparatus capable of forming a liquid film which is as homogenous as possible by preventing the occurrence of the difference of a drying degree between a place where a chemical is first applied and a place where the chemical is applied last on a substrate to be treated to the minimum. <P>SOLUTION: A spiral applicator 1 discharges the chemical from a chemical feeding nozzle 8 moving in a radial direction over the rotating substrate to be treated 10 to apply the chemical in a spiral track on the substrate 10 for forming a liquid film on the substrate 10. On the side of the substrate 10 of a cover 6a covering thereon, a tapered surface 6z having a cross section shape is formed where a center side 6x in the radial direction is thin, and an outer periphery side 6y in the radial direction is thick in thickness. An application starting position of discharging the chemical from the nozzle 8 is set to the center side 10a of the substrate 10 in the radial direction, and the application finishing position of the chemical is set to the outer peripheral side 10b of the substrate 10 in the radial direction. <P>COPYRIGHT: (C)2004,JPO |
