发明名称 CONTROL DEVICE AND METHOD FOR A SUBSTRATE PROCESSING APPARATUS
摘要 <p>An apparatus for controlling a substrate processing apparatus is provided to reduce the energy consumed in an idling process while precisely adjusting the condition in a process chamber by memorizing accumulated data in a memory part and by performing a precise time control while using various kinds of timers. A substrate is processed in a process chamber. A plurality of units adjust the state in the process chamber. An interval of time necessary for recovering each unit from an energy saving mode of suppressing consumption of energy to a normal mode capable of processing a substrate is memorized in every unit by a memory part. Based upon the recover time of each unit memorized in the memory part, a management part predicts an interval of time necessary for recovering a unit from an energy saving mode to a normal mode and starts recovering of a unit in an energy saving mode. A unit control part independently controls each unit to recover the unit in an energy saving mode to a normal mode according to the start time of recovering obtained by the management part. Instead of controlling each unit according to the start time of recovering obtained by the management part, the unit control part can control each unit in a manner that completes recovering of each unit from the energy saving mode by designated end time of recovering.</p>
申请公布号 KR20070092148(A) 申请公布日期 2007.09.12
申请号 KR20070022334 申请日期 2007.03.07
申请人 TOKYO ELECTRON LIMITED 发明人 IIJIMA KIYOHITO
分类号 H01L21/00;H01L21/02;H01L21/027 主分类号 H01L21/00
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