| 摘要 |
A pixel array substrate is provided to reduce manufacturing costs by using only three optical masks when manufacturing the pixel array substrate. A pixel array substrate(300) comprises the following steps of: successively forming a transparent conductive layer and a first conductive layer on a substrate(310); performing a first optical mask process for patterning the first conductive layer and the transparent conductive layer so as to form plural gate electrodes, plural scan lines electrically connected with the gate electrodes, plural data line patterns(342) and plural pixel electrode patterns; forming a dielectric layer and a semiconductor layer on an upper part of the substrate; performing a second optical mask process for patterning the dielectric layer and the semiconductor layer so as to form a channel on an upper part of each gate electrodes and plural contact openings for exposing the data line patterns, and removing the first conductive layer of the pixel electrode patterns so as to form plural pixel electrodes; forming a second conductive layer for filling into the contact openings on an upper part of the substrate so as to form plural contact pads electrically connected with the data line patterns; and performing a third optical mask process for patterning the second conductive layer so as to form plural contacting portions electrically connected with the contact pads, plural source electrodes electrically connected with the data line patterns, and plural drain electrodes electrically connected with the pixel electrodes, and removing the second conductive layer formed on each pixel electrodes.
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