| 摘要 |
<p>A photosensitive resin composition for a color filter is provided to is used for manufacturing a column spacer or a protective film of a photoresist which maintains uniform cell gap in coupling a color filter substrate and TFT(Thin Film Transistor) substrate, and to manufacture a pattern showing excellent developability, coatability, resolution, pattern stability, residual film rate and uniformity. A photoresist resin composition for a color filter comprises (a) an alkali-soluble copolymer containing an acrylic resin; (b) a polyfunctional acrylic monomer having one or more of ethylenically unsaturated bonds; (c) a bifunctional acrylic monomer derived from barbituric acid, which is represented by the formula(1) or (2), alone or a mixture thereof; (d) a photopolymerization initiator; and (e) a solvent. In the formulae(1) and (2), R is a hydrogen atom or an alkyl group having 1-6 carbon atoms, X is an alkylene group having 2-6 carbon atoms, and n is an integer of 1-6.</p> |
