A photomask blank is provided comprising an etch stop film (9) which is disposed on a transparent substrate (1) and is resistant to fluorine dry etching and removable by chlorine dry etching, a light-shielding film (2) disposed on the etch stop film and including at least one layer composed of a transition metal/silicon material, and an antireflective film (3) disposed on the light-shielding film. When the light-shielding film is dry etched to form a pattern, pattern size variation arising from pattern density dependency is reduced, so that a photomask is produced at a high accuracy.
申请公布号
EP1832925(A2)
申请公布日期
2007.09.12
申请号
EP20070251007
申请日期
2007.03.12
申请人
SHIN-ETSU CHEMICAL CO., LTD.;TOPPAN PRINTING CO., LTD.