| 发明名称 |
Method for manufacturing electronic device |
| 摘要 |
A method for manufacturing an electronic device comprising the steps of: dry-etching a Ti-containing metal film formed on a substrate with a gas containing fluorine; and treating the substrate with a chemical solution containing fluorine ions after the dry etching step.
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| 申请公布号 |
US7267127(B2) |
申请公布日期 |
2007.09.11 |
| 申请号 |
US20050222749 |
申请日期 |
2005.09.12 |
| 申请人 |
MATSUSHITA ELECTRIC INDUCTRIAL CO., LTD. |
发明人 |
WATANABE MASAYUKI;WADA YUKIHISA |
| 分类号 |
B08B6/00;H01L21/302 |
主分类号 |
B08B6/00 |
| 代理机构 |
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