Workpiece processor having processing chamber with improved processing fluid flow

摘要

A processing container ( 610 ) for providing a flow of a processing fluid during immersion processing of at least one surface of a microelectronic workpiece is set forth. The processing container comprises a principal fluid flow chamber ( 505 ) providing a flow of processing fluid to at least one surface of the workpiece and a plurality of nozzles ( 535 ) disposed to provide a flow of processing fluid to the principal fluid flow chamber. The plurality of nozzles are arranged and directed to provide vertical and radial fluid flow components that combine to generate a substantially uniform normal flow component radially across the surface of the workpiece. An exemplary apparatus using such a processing container is also set forth that is particularly adapted to carry out an electroplating process. In accordance with a further aspect of the present disclosure, an improved fluid removal path ( 640 ) is provided for removing fluid from a principal fluid flow chamber during immersion processing of a microelectronic workpiece.