APPARATUS FOR RINSING WAFER SIDE AND SPINNER USED THE SAME

摘要

An apparatus for rinsing a wafer side and a spinner including the same are provided to prevent process errors due to inflow of a rinse solution to a center of a wafer in a side rinse process by using a side rinse arm surrounding an edge circumference of the wafer. A spin chuck(222) is used for rotating a wafer(W) on which photoresist is coated. An injection nozzle(224) is used for injecting a rinse solution from an edge of the spin chuck to the photoresist coated on an outer circumference of the wafer. The injection nozzle is directed from a center to an outer circumference on the wafer. A side rinse arm(226) is formed to surround a rim of an edge of the wafer so that the rinse solution is not transferred from the outer circumference to the center of the wafer. The side rinse arm has a C-shaped structure for covering the injection nozzle installed therein.