发明名称 Stress release mechanism in MEMS device and method of making same
摘要 MEMS devices ( 100 ) and methods for forming the devices have now been provided. In one exemplary embodiment, the MEMS device ( 100 ) comprises a substrate ( 106 ) having a surface, an electrode ( 128 ) having a first portion coupled to the substrate surface, and a second portion movably suspended above the substrate surface, and a stress-release mechanism ( 204 ) disposed on the electrode second portion, the stress-release mechanism ( 204 ) including a first slot ( 208 ) integrally formed in the electrode. In another exemplary embodiment, the substrate ( 106 ) includes an anchor ( 134, 136 ) and the stress-release mechanism 222 is formed adjacent the anchor ( 134, 136 ).
申请公布号 US7268463(B2) 申请公布日期 2007.09.11
申请号 US20050192874 申请日期 2005.07.28
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 LI GARY G.;HAMMOND JONATHAN HALE;KOURY, JR. DANIEL N.
分类号 H02N1/00 主分类号 H02N1/00
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