| 摘要 |
A method for printing contacts utilizes photolithographic pattern reversal. A negative of the contact is printed on a resist layer. Unexposed portions of the resist layer are stripped to expose a first layer. The first layer is etched to remove exposed portions of the first layer not covered by the negative of the contact and to expose a second layer. A pattern reversal is performed to cure exposed portions of the second layer not covered by the first layer.
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