发明名称 APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR LOADING SUBSTRATE IN THE APPARATUS
摘要 <p>A substrate processing apparatus and a method for loading a substrate in the same are provided to load/unload quickly the substrate to/from a support member and to simplify the structure of the substrate processing apparatus. A substrate processing apparatus includes a support member for loading a substrate, a transfer robot(100) for transferring the substrate to the support member, and a lift pin assembly for transferring the substrate between the support member and the transfer robot. The lift pin assembly is composed of an unloading member and a loading member. The unloading member is capable of moving up and down. The unloading member includes first lift pins for unloading the substrate from the support member. The loading member(340) is capable of moving up and down. The loading member includes second lift pins for loading the substrate to the support member.</p>
申请公布号 KR100757847(B1) 申请公布日期 2007.09.11
申请号 KR20060047429 申请日期 2006.05.26
申请人 SEMES CO., LTD. 发明人 MUN, SANG MIN;LEE, JONG SEOK
分类号 H01L21/677;H01L21/683 主分类号 H01L21/677
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