| 摘要 |
The invention relates to a coating installation for wafers. Said coating installation comprises a coating device (2) for depositing liquid substances, essentially photopolymer solutions, on rotating wafers and which is provided with a housing (3), a rotating receiving element (4) for the wafer to be coated, an inlet supply line (5) for the liquid substances to be deposited, and a outlet drain (6) for the liquid substances not remaining on the wafer. The housing (3) of the coating device is filled with an inert gas (8) that is constituted by dry, molecular nitrogen or a noble gas or a mixture thereof. The other containers and feed lines of the coating device are gas-tight and are configured in such a manner that an inert atmosphere consisting of molecular nitrogen or noble gases above is formed above their liquid contents. This type of embodiment of a coating installation allows to significantly increase the quality of the production method of wafers or chips and, furthermore, reduce significantly the cost of the method while achieving significant economies in photopolymers and other liquid substances required for the production process. |
