PHOTOMASK BLANK AND PHOTOMASK, AND THEIR MANUFACTURING METHOD

摘要

Provided are a photomask blank and a photomask, which can form a pattern of a shading film having an excellent sectional shape by optimizing the wet etching characteristics of the shading film, and which can form a pattern of a shading film having extremely small jaggies. The photomask blank having the shading film on a transparent substrate is provided for a wet etching treatment exemplifying a mask by a mask pattern formed on the shading film. This wet etching treatment matches a photomask manufacturing method for patterning the shading film. This shading film is made of a material containing chromium, and has a crystal size of 10 nm or less, as calculated from a diffraction peak of CrN(200) by an X-ray diffraction. The shading film is patterned by the wet etching treatment, to produce a photomask having the shading film pattern on the substrate.