发明名称 PHOTOSENSITIVE INK COMPOSITION FOR SCREEN PRINTING AND METHOD OF FORMING POSITIVE RELIEF PATTERN WITH USE THEREOF
摘要 <p>A photosensitive ink that when used as an ink for screen printing, forms a film excelling in insulation, heat resistance, low warpage, low elasticity and adherence to base material, and that ensures low possibility of defects, such as screen mesh clogging, blur, thin spot and void, despite repeated screen printing, thus excelling in printing work performance. There is provided a photosensitive ink composition for screen printing, comprising an organic solvent and, dissolved therein, 100 parts by weight of organic-solvent-soluble block copolymer polyimide and 1 to 100 parts by weight of photoacid generator. The block copolymer polyimide contains, as at least moiety of the diamine component, a diamine having a siloxane bond in its molecular skeleton and an aromatic diamine having hydroxyl and/or carboxyl in the ortho position to amino.</p>
申请公布号 WO2007100078(A1) 申请公布日期 2007.09.07
申请号 WO2007JP54007 申请日期 2007.03.02
申请人 PI R & D CO., LTD.;WIN, MAW SOE;GOSHIMA, TOSHIYUKI;SEGAWA, SIGEMASA;NAKAJIMA, SHINTARO;KYO, EIKA;NISHIKAWA, YOSHIKAZU;WAKI, SHUZO 发明人 WIN, MAW SOE;GOSHIMA, TOSHIYUKI;SEGAWA, SIGEMASA;NAKAJIMA, SHINTARO;KYO, EIKA;NISHIKAWA, YOSHIKAZU;WAKI, SHUZO
分类号 C08G73/10;C09D11/033;C09D11/10;C09D11/101;C09D11/106;H05K3/28 主分类号 C08G73/10
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