发明名称 SUBSTRATE HOLDING DEVICE AND POLISHING APPARATUS
摘要 A substrate holding device according to the present invention includes an elastic membrane to be brought into contact with a rear surface of a substrate, an attachment member for securing at least a portion of the elastic membrane, and a retainer ring for holding a peripheral portion of the substrate while in contact with the elastic membrane. The elastic membrane comprises at least one projecting portion, and the attachment member comprises at least one engagement portion engaging side surfaces of the at least one projecting portion of the elastic membrane. The elastic membrane further comprises bellows portions expandable in a pressing direction so as to allow the elastic membrane to press the substrate, and contractible along the pressing direction.
申请公布号 KR20070091186(A) 申请公布日期 2007.09.07
申请号 KR20077015642 申请日期 2007.07.09
申请人 EBARA CORPORATION 发明人 TOGAWA TETSUJI;YOSHIDA HIROSHI;NABEYA OSAMU;FUKUSHIMA MAKOTO;FUKAYA KOICHI
分类号 H01L21/683;B24B37/005;B24B37/04;B24B37/30;H01L21/304 主分类号 H01L21/683
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