| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pattern correction device capable of reducing the amount of usage of a correction liquid. <P>SOLUTION: In a jetting part 15 of the pattern correction device, a lower part 21d of a jetting nozzle 21 is larger than the upper part. So, the distance between the outer peripheral surface of the lower part 21d of the jetting nozzle 21 and the inner peripheral surface of a vessel 19 is shorter than that between the outer peripheral surface of the upper part of the jetting nozzle 21 and the inner peripheral surface of the vessel 19. Therefore, the liquid level of a correction liquid 20 is raised when the lower part 21d of the jetting nozzle 21 is submerged in the correction liquid 20, allowing a less injection amount of the correction liquid 20. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
