| 摘要 |
A wet station for fabricating a semiconductor device is provided to maintain uniformly the density of chemicals in a bath by including an aspirator system in a wet station. Chemicals for cleaning a wafer are received in an inner bath(110a). The chemicals that are excessively supplied to the inner bath and overflow the inner bath, are received in an outer bath(110b) surrounding the inner bath. An aspirator system maintains a fixed quantity of the chemicals in the outer bath, included in the outer bath and/or inner bath. A pressure sensor(130) can be installed in the outer bath and/or inner bath to check the level of the chemicals by a nitrogen pressure.
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