| 摘要 |
A method of producing a drop discharge head comprising the steps of; providing a silicon substrate; forming a channel-forming element from the silicon substrate having a pressure chamber for containing a fluid to be pressurized, and a nozzle-communicating channel for conducting the pressurized fluid to a nozzle, wherein the nozzle-communicating channel is formed by anisotropic etching of the silicon substrate after forming a non-through hole by dry etching of the silicon substrate.
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