发明名称 |
OPTICAL IMAGE ACQUIRING APPARATUS, PATTERN INSPECTION DEVICE, OPTICAL IMAGE ACQUIRING METHOD AND PATTERN INSPECTION METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To facilitate the focus matching of the pattern image thrown on the light detection surface of an optical image detecting part. <P>SOLUTION: This optical image acquiring apparatus is equipped with a mount on which a sample to be inspected is placed, a light irradiation part for irradiating the sample to be inspected placed on the mount with irradiation light, an optical image detecting part for detecting the irradiation light thrown on the sample to be inspected, a focus adjusting device for matching the focus of the pattern image of the sample to be inspected with the optical image detecting part, a slit image forming device for forming a slit image on the sample to be inspected and an observation display device for displaying the slit image on the sample to be inspected. The focus of the pattern image of the sample to be inspected in the optical image detecting part is adjusted from the slit image on the sample to be inspected displayed on the observation display device. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
申请公布号 |
JP2007225311(A) |
申请公布日期 |
2007.09.06 |
申请号 |
JP20060043906 |
申请日期 |
2006.02.21 |
申请人 |
ADVANCED MASK INSPECTION TECHNOLOGY KK |
发明人 |
HIRANO RYOICHI;OGAWA TSUTOMU |
分类号 |
G01N21/956;G01B11/24;G03F1/84;H01L21/027;H01L21/66 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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