| 摘要 |
PROBLEM TO BE SOLVED: To provide a structure of alignment marks by which the success rate of alignment for each field of view of inspection can be improved with respect to repetitive patterns in the intermediate part of a semiconductor device array by an inspection apparatus. SOLUTION: Alignment marks are formed for each field of view of inspection by using wiring patterns whose difference of brightness is glaring. A normal wire 14 of a width of W (a few micrometers to 10μm) is provided with a rectangular cutout 16 in its right edge which makes its partial width two-thirds of its original width. The feature of the local rectangular shape is referred to as C1. The shape of the feature C1 may be a trapezoid or a semicircle in addition to a rectangle. COPYRIGHT: (C)2007,JPO&INPIT
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